Product Overview

We have developed an algorithm which when given a three-dimensional object can infer from the object's topology the two-dimensional masks needed to produce that object with surface micromachining.Our algorithm, called Faethm, calculates the required two-dimensional mask set needed to produce a given three-dimensional model. Unlike earlier approaches, this algorithm does not involve the creation of trial masks that are iterated through a process simulator nor does this method use a geometry decomposition that is limited to non-isotropic etching processes. Rather, the basis of Faethm is an analysis of the vertical topology of the three-dimensional model coupled with a constrained optimization to meet specific production process requirements.This algorithm has been developed with Sandia's SUMMiT~V process as an initial design goal though it can be adapted to other processes as only the constrained optimization step would change. Validation of this algorithm has started with three-dimensional models and two-dimensional mask sets of parts common to the SUMMiT~V process such as connectors, gears, transmissions, actuators and motors.

Product Highlights

• Automated and integrated mask generation from a CAD constructed 3D model
• The Faethm program is capable of generating accurate mask sets for complex 3D devices. By focusing on a models topology first, this work can identify masks for anisotropic and isotropic (dry and wet) etching processes.

• Create 2D process masks from 3D solid models
• Enabling technology for design optimization
• Previously unsolved “part-to-art” problem

• FAETHM Abstract (.pdf)
• Sandia Labs 2005 Accomplishments (.pdf) [see 'computing' on page 12]

• 06/26/06 - FAETHM is officially patented under patent US 7,065,736