Publications
- Musson,
Lawrence C., Ho, Pauline, Plimpton, Steven J., and Schmidt, Rodney C.,
Feature Length-Scale Modeling of Low-Pressure and Plasma-Enhanced CVD
MEMS Fabrication Processes,J. Microsystems Technologies, 12 [No. 1-2],
pp 137-142, 2005.
- Musson,
Lawrence C, Ho, Pauline, Schmidt, Rodney C, Low-Pressure and Plasma-Enhanced
Chemical Vapor Deposition Modeling at the Feature Length Scale of MEMS
Devices, Technical proceedings American Institute of Chemical Engineers
2004 Annual Meeting, Austin, TX, 2004.
- Musson,
Lawrence C., Ho, Pauline, Plimpton, Steven J., and Schmidt, Rodney C.,
Feature Length-Scale Modeling of Low-Pressure and Plasma-Enhanced CVD
MEMS Fabrication Processes, Technical Proceedings of the 2004 Design,
Test, Integration, and Packaging of MEMS / MOEMS Conference, Hôtel
Eden au Lac, Montreux, Switzerland, 12-14 May 2004.
- Musson,
Lawrence C., Ho, Pauline, Plimpton, Steven J., and Schmidt, Rodney C.,
Feature Length-Scale Modeling of LPCVD and PECVD MEMS Fabrication Processes,
Technical Proceedings of the 2004 Nanotechnology Conference and Trade
Show, NanoTech 2004, Boston Sheraton Hotel and Copley Convention Center,
Boston, MA, USA, 7-11 March 2004.
- Musson,
Lawrence C., Plimton, Steven J., and Schmidt, Rodney C., MEMS Fabrication
Modeling with ChISELS : A Massively Parallel 3D Level-Set Based Feature
Scale modeler, Technical Proceedings of the 2003 Nanotechnology Conference
and Trade Show, Volume 3 NanoTech 2003 Grand Hyatt San Francisco, San
Francisco, CA, USA, 23-27 February 2003.
